Correlation between Interfacial Oxides and Electrical Characteristics of GaN Schottky Diodes
- 期刊名字:半導(dǎo)體光子學(xué)與技術(shù)(英文版)
- 文件大小:
- 論文作者:YU Zhi-wei,ZHOU Wei,ZOU Ze-ya,
- 作者單位:State Key Laboratory of Electronic Thin Films and Integrated Devices,Chongqing Optoelectronics Research Institute
- 更新時(shí)間:2023-02-08
- 下載次數(shù):次
論文簡(jiǎn)介
The electrical characteristics of GaN schottky diode with and without the interfacial oxides are compared in this paper. The influence of interfacial oxides on the electrical characteristics of the schottky diodes has been confirmed by the I-V, C-V measures. We find the barrier height have a reduction of 0.05eV~0.1eV. There is an interfacial insulating oxide with the thickness of 0.05nm~0.1nm after conventional cleaning. Either the forward or the backward currents increase. The backward punch through voltages are reduced to 50% and the capacitances have increased by 100%.
論文截圖
版權(quán):如無(wú)特殊注明,文章轉(zhuǎn)載自網(wǎng)絡(luò),侵權(quán)請(qǐng)聯(lián)系cnmhg168#163.com刪除!文件均為網(wǎng)友上傳,僅供研究和學(xué)習(xí)使用,務(wù)必24小時(shí)內(nèi)刪除。
熱門(mén)推薦
-
C4烯烴制丙烯催化劑 2023-02-08
-
煤基聚乙醇酸技術(shù)進(jìn)展 2023-02-08
-
生物質(zhì)能的應(yīng)用工程 2023-02-08
-
我國(guó)甲醇工業(yè)現(xiàn)狀 2023-02-08
-
石油化工設(shè)備腐蝕與防護(hù)參考書(shū)十本免費(fèi)下載,絕版珍藏 2023-02-08
-
四噴嘴水煤漿氣化爐工業(yè)應(yīng)用情況簡(jiǎn)介 2023-02-08
-
Lurgi和ICI低壓甲醇合成工藝比較 2023-02-08
-
甲醇制芳烴研究進(jìn)展 2023-02-08
-
精甲醇及MTO級(jí)甲醇精餾工藝技術(shù)進(jìn)展 2023-02-08
