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Study on release rate of latent heat in Czochralski silicon growth Study on release rate of latent heat in Czochralski silicon growth

Study on release rate of latent heat in Czochralski silicon growth

  • 期刊名字:稀有金屬
  • 文件大小:
  • 論文作者:REN Bingyan,YANG Jiankun,LI Ya
  • 作者單位:School of Material Science and Engineering
  • 更新時間:2023-02-07
  • 下載次數(shù):
論文簡介

The pulling rate in czochralski silicon (CZSi) growth is important for reducing the cost of solar cell.In this paper, double-heater, heat shield and composite argon duct system were introduced in the Ф450 mm hot zone of a Czochralski furnace.The pulling rate under different thermal system was recorded in experiments.Argon flow and temperature fields were simulated by finite element method(FEM).Experimental results and numerical simulation indicate that double-heater and composite argon duct system can enhance obviously the release rate of latent heat.In Φ 200 mm Czochralski silicon (CZSi) growth, average pulling rate can increase from 0.6 mm·min-1 in the conventional hot zone to 0.8 mm·min-1 in the modified hot zone.

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