Process and properties of electroless Ni-W-B amorphous electrical resistance film
- 期刊名字:中國(guó)有色金屬學(xué)會(huì)會(huì)刊(英文版)
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- 論文作者:ZHU Xiao-yun,GUO Zhong-cheng,X
- 作者單位:The Centre of New Materials and Surface Engineering Research and Development
- 更新時(shí)間:2023-02-08
- 下載次數(shù):次
論文簡(jiǎn)介
The process and properties of electroless plating Ni-W-B alloy have been studied. The results show that the deposits containing W and B are obtained, and the deposition rate of the bath is increased with increase of W content when a certain amount of sodium tungstate solution is added in the Ni-B bath. The Ni-W-B alloy is amorphous as deposition and its resistivity increases directly with the increase of W content in the coating, but decreases gradually with increasing the deposit thickness. XRD and SEM show that the distributions of W and B in the Ni-W-B alloy film are very uniform and dispersed without any segregation.
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