High Temperature Oxidation as a Production Route for Electronic Materials
- 期刊名字:中國腐蝕與防護學報
- 文件大?。?/li>
- 論文作者:W.GAO,Z.W.LI
- 作者單位:
- 更新時間:2023-02-15
- 下載次數(shù):次
Oxidation of metallic components often results in degradation and structural failure, preven-tion is therefore an important topic. On the other hand, oxidation process creates new products such as metal oxides, can be used as a production route. A well-known process in semiconductor industry is that oxidation in dry or wet atmosphere is a popular way for growth of multi-functional SiO films on Si wafers. Recently, oxidation processes under controlled conditions (atmosphere, temperature, and time) are used to prepare various oxides, carbides, or nitrides with micro-/nano-structures, well-defined composition, di-mension, shape and properties. The use of oxidation now includes thin film and nano-/micro-sized devices, and porous oxides for sensing and catalysis purposes. This paper introduces the research activities in the authors' group on applications of oxidation as a tool for synthesis of functional materials.
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