The halide-activated pack cementation method is utilized to codeposit aluminum and silicon on Mo substrate. Emphasis is placed on the microstructure and elevated-temperature oxidation resistance of coatings. The results show that hexagonal Mo (Si, Al)2 as a main phase and a little amount of the lower disilicide MosSis was formed on Mo substrate through the halide-activated pack cementation method. The resultant Si-Al coating on Mo substrate exhibits excellent cyclic oxidation resistance. The excellent cyclic oxidation resistance of the coatings is attributed to the formation of alumina on the coatings during the oxidation.